Atomic bonding and electrical characteristics of two-dimensional graphene/boron nitride van der Waals heterostuctures with manufactured defects via binding energy and bond-charge model
Jiannan Wang, Liangjing Ge, Anlin Deng, Hongrong Qiu, Hanze Li, Yunhu, Zhu, Maolin Bo

TL;DR
This study investigates how manufacturing defects in graphene/BN heterostructures influence their atomic bonding and electrical properties, revealing the first observation of a flat band at the Fermi level due to defect engineering.
Contribution
It introduces a novel application of the binding energy-bond-charge model to defect-engineered graphene/BN heterostructures, demonstrating the emergence of flat bands at the Fermi level.
Findings
Manufacturing defects induce a flat band at the Fermi level.
First report of flat band in defect graphene/BN heterostructures.
Defects significantly alter electronic properties.
Abstract
We used the binding energy-bond-charge model to study the atomic bonding and electrical properties of the two-dimensional graphene/BN van der Waals heterostructure. We manipulated its atomic bonding and electrical properties by manufacturing defects. We discovered that this process yielded a band structure with a flat band, i.e., a horizontal band structure without dispersion at the Fermi level. Thus, our research is significant because it is the first report on this flat band of defect graphene/BN van der Waals heterostructures.
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