Interface engineering of ferroelectricity in thin films of thiophosphate ABP 2 X 6 (A = Cu, Ag; B = In, Bi, Cr, V; and X = S, Se)
Guoliang Yu, Anlian Pan, and Mingxing Chen

TL;DR
This study demonstrates that interface engineering can effectively induce and control ferroelectricity in thiophosphate monolayers, enabling tunable electronic properties for advanced device applications.
Contribution
It introduces a novel interface engineering approach to switch ABP$_2$X$_6$ monolayers from antiferroelectric to ferroelectric states, supported by first-principles calculations.
Findings
AFEP CuInP$_2$Se$_6$ becomes FE when interfaced with certain 2D materials.
CuCrP$_2$S$_6$ remains AFE due to large energy difference, but can be driven into FE with MgO.
Electrical switching of AFE-FE transition and associated band-gap change observed.
Abstract
Two-dimensional ferroelectrics (FEs) are promising in the miniaturization of memory devices with ultra-high-density data storage and low power consumption. However, many thiophosphate monolayers, i.e., analogs of CuInPS and referred to as ABPX, lose ferroelectricity and instead exhibit an antiferroelectric (AFE) or paraelectric ordering. We propose to tune the AFE ABPX monolayers into the FE ordering through interface engineering. The mechanism is that there are couplings between the charge polarizations of the ABPX monolayers and the local dipoles as well as the induced electronic polarizations in the substrate which have a tendency to stabilize the FE ordering. We further perform first-principles calculations for CuInPSe and CuCrPS monolayers and their van der Waals heterostructures. We find that an AFE CuInPSe monolayer becomes…
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