Effect of Electron-Phonon and Electron-Impurity Scattering on Electronic Transport Properties of Silicon/Germanium Superlattices
Manoj Settipalli, Vitaly S Proshchenko, Sanghamitra Neogi

TL;DR
This study uses first-principles calculations to analyze how electron-phonon and electron-impurity scattering influence the electronic transport properties of Si/Ge superlattices, revealing significant effects on power-factor and thermoelectric efficiency.
Contribution
It introduces a detailed scattering model including phonons and impurities, providing new insights into electronic property variations in superlattices under different strain conditions.
Findings
Inclusion of scattering processes can enhance peak power-factors by ~1.56 times.
Lattice strain environments can dramatically reduce power-factors.
Electronic properties vary significantly with composition and substrate, affecting thermoelectric performance.
Abstract
Semiconductor superlattices have been extensively investigated for thermoelectric applications, to explore the effects of compositions, interface structures, and lattice strain environments on the reduction of thermal conductivity, and improvement of efficiency. Most studies assumed that their electronic properties remain unaffected compared to their bulk counterparts. However, recent studies demonstrated that electronic properties of silicon (Si)/germanium (Ge) superlattices show significant variations depending on compositions and growth substrates. These studies used a constant relaxation time approximation, and ignored the effects of electron scattering processes. Here, we consider electron scattering with phonons and ionized impurities, and report first-principles calculations of electronic transport properties including the scattering rates. We investigate two classes of Si/Ge…
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Taxonomy
TopicsAdvanced Thermoelectric Materials and Devices · Thermal properties of materials · Semiconductor Quantum Structures and Devices
