Optimal Scheme for Quantum Metrology
Jing Liu, Mao Zhang, Hongzhen Chen, Lingna Wang, Haidong Yuan
TL;DR
This paper reviews recent advances in optimizing all steps of quantum metrology schemes to achieve the ultimate precision limits, highlighting the importance of state preparation, parametrization, and measurement.
Contribution
It provides a comprehensive review of recent progress in optimizing quantum metrology schemes for maximum precision.
Findings
Recent progress in quantum state preparation techniques
Advances in measurement strategies for quantum metrology
Identification of optimal schemes for ultimate precision
Abstract
Quantum metrology can achieve far better precision than classical metrology, and is one of the most important applications of quantum technologies in the real world. To attain the highest precision promised by quantum metrology, all steps of the schemes need to be optimized, which include the state preparation, parametrization, and measurement. Here the recent progresses on the optimization of these steps, which are essential for the identification and achievement of the ultimate precision limit in quantum metrology, are reviewed. It is hoped this provides a useful reference for the researchers in quantum metrology and related fields.
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