Ultrahigh-$Q$ on-chip silicon-germanium microresonators
Ryan Schilling, Chi Xiong, Swetha Kamlapurkar, Abram Falk, Nathan, Marchack, Stephen Bedell, Richard Haight, Christopher Scerbo, Hanhee Paik,, and Jason S. Orcutt

TL;DR
This paper reports the development of fully crystalline silicon-germanium microresonators with ultrahigh quality factors exceeding 10^8, promising advancements in integrated photonics applications such as frequency combs and quantum transduction.
Contribution
The work introduces epitaxially grown SiGe microresonators with record-high Q factors, significantly improving integrated silicon photonics performance.
Findings
Achieved Q > 10^8 for both polarization modes.
Maximum Q of approximately 1.71×10^8 for TM mode.
Low optical loss of about 0.39 dB/m.
Abstract
We demonstrate fully crystalline, single-mode ultrahigh quality factor integrated microresonators comprising epitaxially grown SiGe waveguide cores with silicon claddings. These waveguides support resonances with internal for both polarization modes, a nearly order-of-magnitude improvement over that seen in prior integrated Si photonics platforms. The maximum is for the transverse magnetic (TM) polarization mode, corresponding to a loss of dB/m. Together with silicon's strong Kerr nonlinearity and low losses in the optical, microwave and acoustic regimes, our results could lead to the SiGe/Si architecture unlocking important new avenues for Kerr frequency combs, optomechanics, and quantum transduction.
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