Hydrogen incorporation into amorphous indium gallium zinc oxide thin-film transistors
George W. Mattson (1), Kyle T. Vogt (1), John F. Wager (2), Matt W., Graham (1) ((1) Department of Physics, Oregon State University, (2) School of, EECS, Oregon State University)

TL;DR
This study investigates how hydrogen incorporation affects the electronic states and operation of amorphous indium gallium zinc oxide thin-film transistors, revealing anomalous donor behavior and defect complex formation.
Contribution
It uncovers the formation of a specific hydrogen-related defect complex in a-IGZO and its impact on subgap states, challenging conventional donor models.
Findings
Hydrogen acts as an anomalous donor in a-IGZO.
Formation of a defect complex [{O_O^{2-}}{H^+}]^{1-} creates subgap states.
Subgap states are centered at 0.4 eV above the valence band edge.
Abstract
Within the subgap of amorphous oxide semiconductors like amorphous indium gallium zinc oxide (a-IGZO) are donor-like and acceptor-like states that control the operational physics of optically transparent thin-film transistors (TFTs). Hydrogen incorporation into the channel layer of a top-gate a-IGZO TFT exists as an electron donor that causes an observed negative shift in the drain current-gate voltage () transfer curve turn-on voltage. Normally, hydrogen is thought to create shallow electronic states just below the conduction band mobility edge, with the donor ionization state controlled by equilibrium thermodynamics involving the position of the Fermi level with respect to the donor ionization energy. However, hydrogen does not behave as a normal donor as revealed by the subgap density of states (DoS) measured by the photoconduction response of top-gate a-IGZO…
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Taxonomy
TopicsThin-Film Transistor Technologies · Advanced Sensor and Energy Harvesting Materials · Phase-change materials and chalcogenides
