P-type behavior of CrN thin films by control of point defects
Arnaud le Febvrier, Davide Gambino, Fabien Giovannelli, Babak Bakhit,, Simon Hurand, Gregory Abadias, Bj\"orn Alling, Per Eklund

TL;DR
This study combines experimental and theoretical approaches to demonstrate how controlling point defects in CrN thin films can switch their electrical behavior from n-type to p-type, with implications for thermoelectric applications.
Contribution
It reveals that both Cr vacancies and N interstitials influence the electrical and structural properties of CrN, enabling defect engineering to tune its semiconducting behavior.
Findings
Transition from n-type to p-type with nitrogen content
Cr vacancies lower the Fermi level, affecting Seebeck coefficient
N2 dumbbells increase lattice parameter and induce holes
Abstract
We report the results of a combined experimental and theoretical study on nonstoichiometric CrN1+d thin films grown by reactive magnetron sputtering on c-plane sapphire, MgO (100) and LaAlO3 (100) substrates in a Ar/N2 gas mixture using different percentage of N2. There is a transition from n-type to p-type behavior in the layers as a function of nitrogen concentration varying from 48 at. % to 52 at. % in CrN films. The compositional change follows a similar trend for all substrates, with a N/Cr ratio increasing from approximately 0.7 to 1.06-1.10 by increasing percentage of N2 in the gas flow ratio. As a result of the change in stoichiometry, the lattice parameter and the Seebeck coefficient increase together with the increase of N in CrN1+d; in particular, the Seebeck value coefficient transitions from -50 uV.K-1 for CrN0.97 to +75 uV.K-1 for CrN1.1. Density functional theory…
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