Resistive switching in HfO2-x/La0.67Sr0.33MnO3 heterostructure: An intriguing case of low H-field susceptibility of an E-field controlled active interface
Vivek Antad, Parvez A. Shaikh, Abhijit Biswas, Shatruhan Rajput,, Shrinivas Deo, Manjusha Shelke, Shivaprasad Patil, and Satishchandra Ogale

TL;DR
This study demonstrates that resistive switching in HfO2-x/La0.67Sr0.33MnO3 heterostructures can be effectively controlled by very low magnetic fields, revealing a novel low-field susceptibility of the active interface for potential ReRAM applications.
Contribution
It introduces a new approach to tuning resistive switching in heterostructures using low magnetic fields, highlighting the active role of the interface in device control.
Findings
Resistive switching exhibits high on/off ratio and stability.
Magnetic field of 30 mT can quench and freeze the switching state.
The quenched state can be recovered with higher bias voltage.
Abstract
High-performance non-volatile resistive random access memories (ReRAM) and their small stimuli control are of immense interest for high-speed computation and big-data processing in the emergent Internet of Things (IOT) arena. Here, we examine the resistive switching (RS) behavior in growth controlled HfO2/La0.67Sr0.33MnO3 heterostructures and their tunability under low magnetic field. It is demonstrated that oxygen-deficient HfO2 films show bipolar switching with high on/off ratio, stable retention, as well as good endurance owing to the orthorhombic-rich phase constitution and charge (de)-trapping-enabled Schottky-type conduction. Most importantly, we have demonstrated that, the RS can be tuned by a very low externally applied magnetic field (0-30 mT). Remarkably, application of a magnetic field of 30 mT causes the RS to be fully quenched and frozen in the high resistance state (HRS)…
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Taxonomy
TopicsAdvanced Memory and Neural Computing · Ferroelectric and Negative Capacitance Devices · Electronic and Structural Properties of Oxides
