Ultrafast Laser Ablation, Intrinsic Threshold, and Nanopatterning of Monolayer Molybdenum Disulfide
Joel M. Solomon, Sabeeh Irfan Ahmad, Arpit Dave, Li-Syuan Lu, Fatemeh, HadavandMirzaee, Shih-Chu Lin, Sih-Hua Chen, Chih-Wei Luo, Wen-Hao Chang, and, Tsing-Hua Her

TL;DR
This paper investigates femtosecond laser ablation of monolayer MoS₂, revealing substrate effects, proposing an intrinsic ablation threshold, and demonstrating high-resolution patterning with potential for scalable manufacturing.
Contribution
It uniquely shows that ablation is an adiabatic process unaffected by substrate thermal coupling, introduces an intrinsic threshold, and demonstrates rapid, high-resolution patterning of monolayer MoS₂.
Findings
Ablation is an adiabatic process with negligible heat transfer.
Substrate effects are due to the etalon effect, not thermal coupling.
Femtosecond laser patterning achieves sub-micron resolution at mm/s speeds.
Abstract
Laser direct writing is an attractive method for patterning 2D materials without contamination. Literature shows that the femtosecond ablation threshold of graphene across substrates varies by an order of magnitude. Some attribute it to the thermal coupling to the substrates, but it remains by and large an open question. For the first time the effect of substrates on femtosecond ablation of 2D materials is studied using MoS as an example. We show unambiguously that femtosecond ablation of MoS is an adiabatic process with negligible heat transfer to the substrates. The observed threshold variation is due to the etalon effect which was not identified before for the laser ablation of 2D materials. Subsequently, an intrinsic ablation threshold is proposed as a true threshold parameter for 2D materials. Additionally, we demonstrate for the first time femtosecond laser patterning…
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