Photoluminescence enhancement by deterministically site-controlled, vertically stacked SiGe quantum dots
Jeffrey Schuster, Johannes Aberl, Lada Vuku\v{s}i\'c, Lukas, Spindlberger, Heiko Groiss, Thomas Fromherz, Moritz Brehm, and Friedrich, Sch\"affler

TL;DR
This paper demonstrates that strain-engineered, vertically stacked SiGe quantum dots significantly enhance photoluminescence efficiency and thermal stability, offering a promising approach for silicon-compatible light sources.
Contribution
It introduces a novel strain engineering method for vertically stacked SiGe QDs that improves light emission by separating stress and radiative functions, validated through simulations and experiments.
Findings
Enhanced photoluminescence at higher temperatures.
Suppressed emission from wetting layers.
Shifted thermal quenching behavior.
Abstract
The Si/SiGe heterosystem would be ideally suited for the realization of complementary metal-oxide-semiconductor (CMOS)-compatible integrated light sources, but the indirect band gap, exacerbated by a type-II band offset, makes it challenging to achieve efficient light emission. We address this problem by strain engineering in ordered arrays of vertically close-stacked SiGe quantum dot (QD) pairs. The strain induced by the respective lower QD creates a preferential nucleation site for the upper one and strains the upper QD as well as the Si cap above it. Electrons are confined in the strain pockets in the Si cap, which leads to an enhanced wave function overlap with the heavy holes near the upper QD's apex. With a thickness of the Si spacer between the stacked QDs below 5 nm, we separated the functions of the two QDs: The role of the lower one is that of a pure stressor, whereas only the…
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