A synchrotron-based kilowatt-level radiation source for EUV lithograph

TL;DR

This paper proposes a compact synchrotron-based system capable of generating kilowatt-level coherent EUV radiation at 13.5 nm, utilizing a novel micro-bunching method to enhance power output for lithography applications.

Contribution

It introduces a compact damping ring design and a laser-based micro-bunching technique to produce high-power EUV radiation, advancing lithography technology.

Findings

Achieves about 2.5 kW of EUV radiation power.

Utilizes a 160 m circumference damping ring.

Employs laser-induced micro-bunching for coherence.

Abstract

A compact damping ring with limited circumference of about 160 m is proposed for producing kilowatt-level coherent EUV radiation. The electron bunch in the ring is modulated by a 257nm wavelength laser with the help of the angular dispersion induced micro-bunching method [C. Feng and Z. Zhao, Sci. Rep. 7, 4724 (2017)]. Coherent radiation at 13.5 nm with an average power of about 2.5 kW can be achieved with the state-of-the-art accelerator and laser technologies.