Growth modes of partially fluorinated organic molecules on amorphous silicon dioxide
Mila Miletic, Karol Palczynski, Joachim Dzubiella

TL;DR
This study uses molecular dynamics simulations to show how fluorination of organic molecules influences their growth modes on amorphous silicon dioxide, enabling controlled surface layer formation.
Contribution
It reveals how partial fluorination changes growth from rough to smooth, layer-by-layer, by modifying molecule-substrate interactions and chiral island formation.
Findings
Fluorination leads to smoother, layer-by-layer growth.
Chiral structures dominate initial growth stages.
Fluorinated molecules have lower step-edge crossing barriers.
Abstract
We study the influence of fluorination on nucleation and growth of the organic para-sexiphenyl molecule (p-6P) on amorphous silicon dioxide (-SiO) by means of atomistically resolved classical molecular dynamics computer simulations. We use a simulation model that mimics the experimental deposition from the vapor and subsequent self-assembly onto the underlying surface. Our model reproduces the experimentally observed orientational changes from lying to upright standing configurations of the grown layers. We demonstrate that the increase in the number of fluorinated groups inside the p-6P leads to a smoother, layer-by-layer growth on the -SiO surface: We observe that in the first layers, due to strong molecule-substrate interactions the molecules first grow in chiral (fan-like) structures, where each consecutive molecule has a higher angle, supported by molecules…
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Taxonomy
TopicsSilicon Nanostructures and Photoluminescence
