Model and Measurements of an Optical Stack for Broadband Visible to Near-IR Absorption in TiN KIDs
K. Kouwenhoven, I. Elwakil, J. van Wingerden, V. Murugesan, D. J., Thoen, J. J. A. Baselmans, P. J. de Visser

TL;DR
This paper presents a design and measurement of an optical stack for TiN Kinetic Inductance Detectors, achieving broadband absorption of over 80% from visible to near-IR wavelengths, enhancing detector efficiency.
Contribution
The paper introduces a novel optical stack design optimized for broadband absorption in TiN KIDs, validated through modeling and experimental measurements.
Findings
Achieves >80% absorption from 400 nm to 1550 nm
Model and measurements are in good agreement
Near-unity absorption for 500-800 nm
Abstract
Typical materials for optical Kinetic Inductance Detetectors (KIDs) are metals with a natural absorption of 30-50% in the visible and near-infrared. To reach high absorption efficiencies (90-100%) the KID must be embedded in an optical stack. We show an optical stack design for a 60 nm TiN film. The optical stack is modeled as sections of transmission lines, where the parameters for each section are related to the optical properties of each layer. We derive the complex permittivity of the TiN film from a spectral ellipsometry measurement. The designed optical stack is optimised for broadband absorption and consists of, from top (illumination side) to bottom: 85 nm SiOx, 60 nm TiN, 23 nm of SiOx, and a 100 nm thick Al mirror. We show the modeled absorption and reflection of this stack, which has >80% absorption from 400 nm to 1550 nm and near-unity absorption for 500 nm to 800 nm. We…
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Taxonomy
TopicsPhotonic and Optical Devices · Spectroscopy and Laser Applications · Advanced Semiconductor Detectors and Materials
