Topologically Protected Ferroelectric Domain Wall Memory with Large Readout Current
Wenda Yang, Guo Tian, Hua Fan, Yue Zhao, Hongying Chen, Luyong Zhang,, Yadong Wang, Zhen Fan, Zhipeng Hou, Deyang Chen, Jinwei Gao, Min Zeng, Xubing, Lu, Minghui Qin, Xingsen Gao, Jun-Ming Liu

TL;DR
This paper presents a stable, fatigue-resistant ferroelectric memory device utilizing topologically confined domain walls in BiFeO3, achieving high resistance contrast, long retention, and robust cycling performance for advanced nanoscale memory applications.
Contribution
It introduces a novel ferroelectric memory based on topologically confined domain walls with reversible switching and high endurance, leveraging topological robustness for improved device performance.
Findings
Resistance ratio > 10^4 between states
Endurance over 10^6 cycles
Retention exceeding 12 days
Abstract
The discovery and precise manipulation of atomic-size conductive ferroelectric domain defects, such as geometrically confined walls, offer new opportunities for a wide range of prospective electronic devices, and the so-called walltronics is emerging consequently. Here we demonstrate the highly stable and fatigue-resistant nonvolatile ferroelectric memory device based on deterministic creation and erasure of conductive domain wall geometrically confined inside a topological domain structure. By introducing a pair of delicately designed co-axial electrodes onto the epitaxial BiFeO3 film, one can easily create quadrant center topological polar domain structure. More importantly, a reversible switching of such center topological domain structure between the convergent state with highly conductive confined wall and the divergent state with insulating confined wall can be realized, hence…
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Taxonomy
TopicsMultiferroics and related materials · Advanced Condensed Matter Physics · Ferroelectric and Piezoelectric Materials
