True Atomic-Resolution Imaging under Ambient Conditions via Conductive Atomic Force Microscopy
Saima A. Sumaiya, Mehmet Z. Baykara

TL;DR
This paper demonstrates that conductive atomic force microscopy (C-AFM) can achieve true atomic-resolution imaging under ambient conditions, overcoming limitations of traditional methods like STM and NC-AFM which require UHV and low temperatures.
Contribution
The authors show for the first time that C-AFM can be used to image surfaces at atomic resolution under ambient conditions, without elaborate sample preparation.
Findings
Achieved atomic-resolution imaging of MoS2 using C-AFM under ambient conditions.
Successfully imaged a single atomic vacancy on MoS2.
Overcame classical limitations of STM and NC-AFM for ambient atomic imaging.
Abstract
Atomic-scale characteristics of surfaces dictate the principles governing numerous scientific phenomena ranging from catalysis to friction. Despite this fact, our ability to visualize and alter surfaces on the atomic scale is severely hampered by the strict conditions under which the related methods are operated to achieve high spatial resolution. In particular, the two prominent methods utilized to achieve atomic-resolution imaging - scanning tunneling microscopy (STM) and noncontact atomic force microscopy (NC-AFM) - are typically performed under ultrahigh vacuum (UHV) and often at low temperatures. Perhaps more importantly, results obtained under such well-controlled, pristine conditions bear little relevance for the great majority of processes and applications that often occur under ambient conditions. As such, a method that can robustly image surfaces on the atomic scale under…
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Taxonomy
TopicsForce Microscopy Techniques and Applications · Integrated Circuits and Semiconductor Failure Analysis · Electronic and Structural Properties of Oxides
