Gate-versus defect-induced voltage drop and negative differential resistance in vertical graphene heterostructures
Tae Hyung Kim, Juho Lee, Ryong-Gyu Lee, Yong-Hoon Kim

TL;DR
This paper introduces a novel non-equilibrium first-principles method to study voltage drops and negative differential resistance in graphene-based heterostructures, revealing defect-level dynamics crucial for device design.
Contribution
It develops a new computational approach for non-equilibrium properties of 2D heterostructures and uncovers defect-induced effects on electronic transport.
Findings
Negative differential resistance arises from defect level shifts.
Bias voltage induces electron filling of defect states.
Defect position influences voltage drop profiles and NDR presence.
Abstract
Vertically stacked two-dimensional (2D) van der Waals (vdW) heterostructures based on graphene electrodes represent a promising architecture for next-generation electronic devices. However, their first-principles characterizations have been so far mostly limited to the equilibrium state due to the limitation of the standard non-equilibrium Green's function approach. To overcome these challenges, we introduce a non-equilibrium first-principles calculation method based on the recently developed multi-space constrained-search density functional formalism and apply it to graphene/few-layer hexagonal boron nitride (hBN)/graphene field-effect transistors. Our explicit finite-voltage first-principles calculations show that the previously reported negative differential resistance (NDR) current-bias voltage characteristics can be produced not only from the gating-induced mismatch between two…
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