Fabricacion de un magnetron sputtering para deposito de peliculas nanometricas magneticas

TL;DR

This paper details the development of a sputtering system for depositing ferromagnetic nanometric films, specifically Permalloy, on silicon substrates, with characterization confirming film quality and composition.

Contribution

It introduces a specialized magnetron sputtering setup for ferromagnetic thin film fabrication with optimized parameters and characterization methods.

Findings

Achieved a deposition rate of 16.2 nm/min for Permalloy.

Produced continuous ferromagnetic films with desired composition.

Validated film quality with profilometry and electron microscopy.

Abstract

This paper presents the development of scientific instrumentation for the fabrication of ferromagnetic thin films, by sputtering technique, for the use of 2-inch-diameter targets. Thin films were deposited using Permalloy alloy (Ni80Fe20) as ferromagnetic material at room temperature on Si (001) substrates. The film thicknesses were measured with profilometry and a deposition rate for this alloy of 16.2 nm/min was calculated. Scanning electron microscopy showed a continuous film formation and a chemical composition similar to the target