Very high frequency probes for atomic force microscopy with silicon optomechanics
L Schwab (LAAS-MEMS), P Allain, N Mauran (LAAS-I2C), X Dollat, (LAAS-I2C), L Mazenq (LAAS-I2C), D Lagrange (LAAS-I2C), M G\'ely (CEA-LETI),, S Hentz (CEA-LETI), G Jourdan (CEA-LETI), I Favero (MPQ (UMR\_7162)), B, Legrand (LAAS-MEMS)

TL;DR
This paper introduces a silicon-based optomechanical sensor operating above 100 MHz for atomic force microscopy, enabling force measurements at previously unexplored timescales with high sensitivity and stability.
Contribution
The work demonstrates the fabrication and integration of a high-frequency silicon optomechanical probe for AFM, achieving unprecedented operational speed and displacement sensitivity.
Findings
Probe operates at 130 MHz with a quality factor of 900 in air.
Displacement detection limit of 3.10^-16 m/√Hz.
Stable force-distance measurements with sub-picometer vibration amplitude.
Abstract
Atomic force microscopy (AFM) has been constantly supporting nanosciences and nanotechnologies for over 30 years, being present in many fields from condensed matter physics to biology. It enables measuring very weak forces at the nanoscale, thus elucidating interactions at play in fundamental processes. Here we leverage the combined benefits of micro/nanoelectromechanical systems and cavity optomechanics to fabricate a sensor for dynamic mode AFM at a frequency above 100 MHz. This is two decades above the fastest commercial AFM probes, suggesting opportunity for measuring forces at timescales unexplored so far. The fabrication is achieved using very-large scale integration technologies inherited from photonic silicon circuits. The probe's ring optomechanical cavity is coupled to a 1.55 um laser light and features a 130 MHz mechanical resonance mode with a quality factor of 900 in air. A…
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Taxonomy
TopicsForce Microscopy Techniques and Applications · Mechanical and Optical Resonators · Advanced MEMS and NEMS Technologies
