An efficient plasma-surface interaction surrogate model for sputtering processes based on autoencoder neural networks
Tobias Gergs, Borislav Borislavov, and Jan Trieschmann

TL;DR
This paper introduces a streamlined machine learning surrogate model for sputtering processes that uses autoencoder neural networks to efficiently capture complex plasma-surface interactions with fewer parameters.
Contribution
It develops a convolutional variational autoencoder combined with a regression network, significantly reducing model complexity while accurately representing sputtering dynamics.
Findings
Reduced model parameters to 486, enhancing efficiency.
Achieved competitive performance with fewer degrees of freedom.
Method is adaptable to more complex physical models.
Abstract
Simulations of thin film sputter deposition require the separation of the plasma and material transport in the gas-phase from the growth/sputtering processes at the bounding surfaces. Interface models based on analytic expressions or look-up tables inherently restrict this complex interaction to a bare minimum. A machine learning model has recently been shown to overcome this remedy for Ar ions bombarding a Ti-Al composite target. However, the chosen network structure (i.e., a multilayer perceptron) provides approximately 4 million degrees of freedom, which bears the risk of overfitting the relevant dynamics and complicating the model to an unreliable extend. This work proposes a conceptually more sophisticated but parameterwise simplified regression artificial neural network for an extended scenario, considering a variable instead of a single fixed Ti-Al stoichiometry. A convolutional…
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