An Accurate Process Induced Variability Aware Compact Model-based Circuit Performance Estimation for Design-Technology Co-optimization
Shubham Patil, Amita Rawat, and Udayan Ganguly

TL;DR
This paper presents a highly accurate process-induced variability aware compact modeling approach for circuit performance estimation in 7nm FinFETs, significantly improving design-technology co-optimization accuracy.
Contribution
It introduces an improved variability model that enhances device and circuit performance prediction accuracy for sub-10nm FinFETs, validated with experimental data.
Findings
Achieved 2.3x to 4x accuracy improvement in device figure of merits estimation.
Demonstrated 22% more optimistic static hold margin estimate.
Reduced dynamic power by up to 73% in worst-case scenarios.
Abstract
In sub-10nm FinFETs, Line-edge-roughness (LER) and metal-gate granularity (MGG) are the two most dominant sources of variability and are mostly modeled semi-empirically. In this work, compact models of LER and MGG are used. We show an accurate process-induced variability (PIV) aware compact model-based circuit performance estimation for Design-Technology Co-optimization (DTCO). This work is carried out using an experimentally validated BSIM-CMG model on a 7nm FinFET node. First, we have shown performance bench-marking of LER and MGG models with the state-of-the-art and shown {\textbackslash}4x({\textbackslash}2.3x) accuracy improvement for NMOS(PMOS) in the estimation of device figure of merits (DFoMs). Second, RO and SRAM circuits performance estimation is carried out for LER and MGG variability. Further, {\textbackslash}22\% more optimistic estimate of…
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