Generating Electron Beam Lithography Write Parameters from the FORTIS Holographic Grating Solution

TL;DR

This paper presents a method to derive electron beam lithography parameters for creating high-efficiency, curved, variably-spaced diffraction gratings for the OAxFORTIS ultraviolet spectrograph, improving its performance and mitigating Lyα scatter.

Contribution

It introduces a novel approach to transform holographic grating parameters into 3D electron beam lithography instructions for advanced grating fabrication.

Findings

Derived formalism for grating parameter transformation.

Developed process for selecting silicon wafers with proper crystalline orientation.

Prepared fabrication methods for high-efficiency blazed gratings.

Abstract

The Far-UV Off Rowland-circle Telescope for Imaging and Spectroscopy (FORTIS) has been successful in maturing technologies for carrying out multi-object spectroscopy in the far-UV, including: the successful implementation of the Next Generation of Microshutter Arrays; large-area microchannel plate detectors; and an aspheric "dual-order" holographically ruled diffraction grating with curved, variably-spaced grooves with a laminar (rectangular) profile. These optical elements were used to construct an efficient and minimalist "two-bounce" spectro-telescope in a Gregorian configuration. However, the susceptibility to Lyman alpha (Ly$\alpha$) scatter inherent to the dual order design has been found to be intractably problematic, motivating our move to an "Off-Axis" design. OAxFORTIS will mitigate its susceptibility to Ly$\alpha$ by enclosing the optical path, so the detector only receives light from the grating. The new design reduces the collecting area by a factor of 2, but the overall effective area can be regained and improved through the use of new high efficiency reflective coatings, and with the use of a blazed diffraction grating. This latter key technology has been enabled by recent advancements in creating very high efficiency blazed gratings with impressive smoothness using electron beam lithography and chemical etching to create grooves in crystalline silicon. Here we discuss the derivation for the OAxFORTIS grating solution as well as methods used to transform the FORTIS holographic grating recording parameters (following the formalism of Noda et al.1974a,b), into curved and variably-spaced rulings required to drive the electron beam lithography write-head in three dimensions. We will also discuss the process for selecting silicon wafers with the proper orientation of the crystalline planes and give an update on our fabrication preparations.