Ultimate bunch length and emittance performance of an MeV ultrafast electron diffraction apparatus with a DC gun and a multi-cavity SRF linac

TL;DR

This paper designs a high-repetition-rate MeV ultrafast electron diffraction system using a DC gun and multi-cavity SRF linac, optimizing for minimal bunch length and emittance through simulations.

Contribution

It introduces a novel design leveraging multiple cavities for flexible phase space control, enabling sub-fs bunch lengths and high brightness for UED applications.

Findings

Achieves sub-femtosecond bunch lengths in simulations.

Maintains micron-scale probe spot sizes with low emittance.

Demonstrates high repetition rates up to 1.3 GHz with high brightness.

Abstract

We present the design of a high repetition rate MeV energy ultrafast electron diffraction instrument based on a DC photoelectron gun and an SRF linac with multiple independently controlled accelerating and bunching cavities. The design is based on the existing Cornell photoinjector, which can readily be applied to the presented findings. Using particle tracking simulations in conjunction with multiobjective genetic algorithm optimization, we explore the smallest bunch lengths, emittance, and probe spot sizes achievable. We present results for both stroboscopic conditions (with single electrons per pulse) and with $10^5$ electrons/bunch which may be suitable for single-shot diffraction images. In the stroboscopic case, the flexibility provided by the many-cavity bunching and acceleration allows for longitudinal phase space linearization without a higher harmonic field, providing sub-fs bunch lengths at the sample. Given low emittance photoemission conditions, these small bunch lengths can be maintained with probe transverse sizes at the single micron scale and below. In the case of $10^5$ electrons per pulse, we simulate state-of the art 5D brightness conditions: rms bunch lengths of 10 fs with 3 nm normalized emittances, while now permitting repetition rates as high as 1.3 GHz. Finally, to aid in the design of new SRF-based UED machines, we simulate the trade-off between the number of cavities used and achievable bunch length and emittance.