Near total reflection X-ray photoelectron spectroscopy: Quantifying chemistry at solid/liquid and solid/solid interfaces
Henrique P. Martins, Giuseppina Conti, Isvar Cordova, Lorenz Falling,, Heath Kersell, Farhad Salmassi, Eric Gullikson, Inna Vishik, Christoph, Baeumer, Patrick Naulleau, Claus M. Schneider, Slavomir Nemsak

TL;DR
This paper demonstrates the use of near total reflection X-ray photoelectron spectroscopy to precisely analyze chemical concentration gradients and buried interfaces at solid/liquid and solid/solid boundaries with nanometer depth resolution.
Contribution
It introduces practical methods for ambient pressure X-ray photoelectron spectroscopy using near total reflection, enabling high-resolution interface analysis without complex sample preparation.
Findings
Depth accuracy of ~1 nm achieved
Effective analysis of buried interfaces and concentration profiles
Simplified sample preparation compared to multilayer mirror techniques
Abstract
Near total reflection regime has been widely used in X-ray science, specifically in grazing incidence small angle X-ray scattering and in hard X-ray photoelectron spectroscopy. In this work, we introduce some practical aspects of using near total reflection in ambient pressure X-ray photoelectron spectroscopy and apply this technique to study chemical concentration gradients in a substrate/photoresist system. Experimental data are accompanied by X-ray optical and photoemission simulations to quantitatively probe the photoresist and the interface with the depth accuracy of ~1 nm. Together, our calculations and experiments confirm that near total reflection X-ray photoelectron spectroscopy is a suitable method to extract information from buried interfaces with highest depth-resolution, which can help address open research questions regarding our understanding of concentration profiles,…
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