Characterization of laser-induced ionization dynamics in solid dielectrics
Peter J\"urgens, Benjamin Liewehr, Bj\"orn Kruse, Christian Peltz,, Tobias Witting, Anton Husakou, Arnaud Rouzee, Mikhail Ivanov, Thomas Fennel,, Marc. J. J. Vrakking, Alexandre Mermillod-Blondin

TL;DR
This paper investigates how intense femtosecond laser pulses induce plasma in solid dielectrics, linking harmonic emission to plasma formation and identifying key ionization mechanisms for improved laser processing control.
Contribution
It provides a detailed analysis of laser-induced plasma dynamics in solids, highlighting the roles of strong-field and electron-impact ionization mechanisms.
Findings
Harmonic emission correlates with plasma formation.
Two ionization mechanisms are identified as dominant.
Total plasma density measurements support the analysis.
Abstract
The formation of an electron-hole plasma during the interaction of intense femtosecond laser pulses with transparent solids lies at the heart of femtosecond laser processing. Advanced micro- and nanomachining applications require improved control over the excitation characteristics. Here, we relate the emission of low-order harmonics to the strong laser-field-induced plasma formation. Together with a measurement of the total plasma density we identify the contribution of two competing ionization mechanisms - strong-field and electron-impact ionization.
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Taxonomy
TopicsLaser-induced spectroscopy and plasma · Laser Material Processing Techniques · Laser-Matter Interactions and Applications
