Surface production of negative ions from pulse-biased nitrogen doped diamond within a low-pressure deuterium plasma
Gregory J. Smith, Lenny Tahri, Jocelyn Achard, Riadh Issaoui, Timo, Gans, James P. Dedrick, Gilles Cartry

TL;DR
This study investigates negative ion production from nitrogen-doped diamond in low-pressure deuterium plasma using pulsed biasing, revealing enhanced yields and insights into defect surface ratios for improved ion generation.
Contribution
It introduces pulsed biasing as a method to study negative ion surface production on nitrogen-doped diamond, highlighting its potential to improve ion yields without low work function metals.
Findings
Negative ion yield is approximately 20% higher for nitrogen-doped diamond.
Pulsed bias results in lower peak negative ion yield than continuous bias.
Optimal defect surface ratios can enhance negative ion production.
Abstract
The production of negative ions is of significant interest for applications including mass spectrometry, materials surface processing, and neutral beam injection for magnetic confined fusion. Neutral beam injection sources maximise negative ion production through the use of surface production processes and low work function metals, which introduce complex engineering. Investigating materials and techniques to avoid the use of low work function metals is of interest to broaden the application of negative ion sources and simplify future devices. In this study, we use pulsed sample biasing to investigate the surface production of negative ions from nitrogen doped diamond. The use of a pulsed bias allows for the study of insulating samples in a preserved surface state at temperatures between 150C and 700C in a 2 Pa, 130 W, (n cm, T 0.6…
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