Model of the Weak Reset Process in HfOx Resistive Memory for Deep Learning Frameworks
Atreya Majumdar, Marc Bocquet, Tifenn Hirtzlin, Axel Laborieux,, Jacques-Olivier Klein, Etienne Nowak, Elisa Vianello, Jean-Michel Portal,, Damien Querlioz

TL;DR
This paper develops and validates a model of the weak RESET process in hafnium oxide RRAM, integrated into PyTorch, to simulate device variability effects on deep learning training, aiding device optimization.
Contribution
It introduces a novel model of the weak RESET process in HfOx RRAM, compatible with deep learning frameworks, and analyzes device imperfections' impact on neural network training.
Findings
Model accurately reproduces noisy resistance changes and variability.
Device-to-device variability significantly affects training performance.
Framework helps identify device issues that degrade deep learning accuracy.
Abstract
The implementation of current deep learning training algorithms is power-hungry, owing to data transfer between memory and logic units. Oxide-based RRAMs are outstanding candidates to implement in-memory computing, which is less power-intensive. Their weak RESET regime, is particularly attractive for learning, as it allows tuning the resistance of the devices with remarkable endurance. However, the resistive change behavior in this regime suffers many fluctuations and is particularly challenging to model, especially in a way compatible with tools used for simulating deep learning. In this work, we present a model of the weak RESET process in hafnium oxide RRAM and integrate this model within the PyTorch deep learning framework. Validated on experiments on a hybrid CMOS/RRAM technology, our model reproduces both the noisy progressive behavior and the device-to-device (D2D) variability.…
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