Large-Area Transfer of 2D TMDCs Assisted by Water-soluble layer for Potential Device Applications
Madan Sharma, Aditya Singh, Pallavi Aggarwal, Rajendra Singh

TL;DR
This paper presents a scalable, clean water-assisted transfer method for large-area 2D TMDCs, enabling their integration into flexible electronics and optoelectronic devices with high performance.
Contribution
A novel water-soluble layer-assisted transfer technique for large-area 2D TMDCs that preserves film quality and enables device fabrication.
Findings
Successful transfer of centimeter-scale 2D TMDCs onto various substrates.
Fabrication of a broadband photodetector with significantly enhanced photocurrent.
The transfer method is fast, clean, and scalable for industrial applications.
Abstract
Layer transfer offers enormous potential for the industrial implementation of 2D material technology platforms. However, the transfer method used must retain as-grown uniformity and cleanliness in the transferred films for the fabrication of 2D material-based. Additionally, the method used must be capable of large-area transfer to maintain wafer-scale fabrication standards. Here, a facile route to transfer centimeter-scale synthesized 2D TMDCs (3L MoS2, 1L WS2) onto various substrates such as sapphire, SiO2/Si, and flexible substrates (mica, polyimide) has been developed using a water-soluble layer (Na2S/Na2SO4) underneath the as-grown film. The developed transfer process represents a fast, clean, generic, and scalable technique to transfer 2D atomic layers. The key strategy used in this process includes the dissolution of Na2S/Na2SO4 layer due to the penetration of NaOH solution…
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