Three-electron bunches in occupation of a 5-site Coulomb cluster
R. E. Putnam, Jr., M. E. Raikh

TL;DR
This paper investigates electron bunching phenomena in a 5-site Coulomb cluster, revealing that three-electron bunching occurs due to rearrangements influenced by screened Coulomb interactions, extending previous findings on electron attraction and bunching.
Contribution
It demonstrates for the first time that three-electron bunching can occur in a 5-site Coulomb cluster with screened interactions, expanding understanding of electron correlation effects.
Findings
Three-electron bunching observed in a 5-site Coulomb cluster.
Rearrangement of site occupations causes electron bunching.
Screened Coulomb repulsion facilitates complex occupation changes.
Abstract
Attraction of like charges in a localized system implies that, upon increasing the Fermi energy, the occupation of the system changes as, n\rightarrow (n+2), while the occupation, (n+1), is skipped. In this way, the attraction translates into the bunching of electrons. For a localized system of N=4 sites, attraction of electrons manifests itself in skipping of n=2 occupation. The origin of the attraction is rearrangement of the occupations of the surrounding sites which plays the role of a polaronic effect. We consider an N=5-site cluster and demonstrate that, with screened Coulomb repulsion, three-electron bunching becomes possible, i.e. the change of occupation n=1\rightarrow n=4 with n=2 and n=3 occupations skipped.
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