Engineering optically active defects in hexagonal boron nitride using focused ion beam and water
Evgenii Glushkov, Michal Macha, Esther Rath, Vytautas Navikas, Nathan, Ronceray, Cheol Yeon Cheon, Ahmed Aqeel, Ahmet Avsar, Kenji Watanabe, Takashi, Taniguchi, Ivan Shorubalko, Andras Kis, Georg Fantner, and Aleksandra, Radenovic

TL;DR
This paper investigates how focused ion beam (FIB) techniques can be used to create and control optically-active defects in hexagonal boron nitride (hBN), revealing the physical mechanisms and effects of water exposure for potential nanophotonics and quantum sensing applications.
Contribution
It systematically explores the defect formation process in hBN using FIB and water, providing insights into defect creation, structural changes, and precise emitter localization.
Findings
FIB induces local amorphization and mechanical deterioration in hBN.
Water exposure causes a structural and optical transition between defect types.
Super-resolution microscopy confirms defected edges as primary emitter sources.
Abstract
Hexagonal boron nitride (hBN) has emerged as a promising material platform for nanophotonics and quantum sensing, hosting optically-active defects with exceptional properties such as high brightness and large spectral tuning. However, precise control over deterministic spatial positioning of emitters in hBN remained elusive for a long time, limiting their proper correlative characterization and applications in hybrid devices. Recently, focused ion beam (FIB) systems proved to be useful to engineer several types of spatially-defined emitters with various structural and photophysical properties. Here we systematically explore the physical processes leading to the creation of optically-active defects in hBN using FIB, and find that beam-substrate interaction plays a key role in the formation of defects. These findings are confirmed using transmission electron microscopy that reveals local…
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Taxonomy
TopicsDiamond and Carbon-based Materials Research · Ion-surface interactions and analysis · Integrated Circuits and Semiconductor Failure Analysis
