Investigation of superconducting properties of NbN films deposited by DC magnetron sputtering on high-k dielectric HfO2 buffer layer
N. V. Porokhov, A. P. Sirotina, E. A. Pershina, M. V. Shibalov, G. D., Diudbin, A. V. Mumlyakov, E. R. Timofeeva, I.V. Trofimov, A. M. Tagachenkov,, Yu. V. Anufriev, E. V. Zenova, M. A. Tarkhov

TL;DR
This study investigates how a HfO2 buffer layer affects the superconducting properties of NbN films deposited via reactive magnetron sputtering, providing new insights into film morphology and microstructure.
Contribution
It is the first comprehensive analysis of how hafnia dielectric buffer layers influence the superconducting, morphological, and microstructural properties of NbN films.
Findings
HfO2 buffer layer modifies NbN film morphology
Superconducting properties are affected by the buffer layer
Microstructural characteristics are linked to buffer layer presence
Abstract
The influence of the buffer layer of hafnia dielectric on superconducting properties of niobium nitride films, produced by the technique of the reactive magnetron depositing has been investigated for the first time. This study presents a comprehensive analysis of morphological, microstructural, and electrophysical parameters of thin NbN films.
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Taxonomy
TopicsMetal and Thin Film Mechanics · Semiconductor materials and devices · Silicon Carbide Semiconductor Technologies
