Multiperiodic magnetoplasmonic gratings fabricated by the pulse force nanolithography

TL;DR

This paper introduces a new pulse force nanolithography technique for fabricating high-quality magnetoplasmonic gratings with lower losses and tunable excitation efficiency, assessed via magneto-optical Kerr effect.

Contribution

It presents a novel fabrication method for magnetoplasmonic nanostructures that improves quality and control over plasmonic properties compared to traditional electron beam lithography.

Findings

Lower total losses in gratings compared to electron beam lithography

Control of SPP excitation efficiency through grating parameters

High sensitivity of the Kerr effect to structure finesse

Abstract

We propose a novel technique for the magnetoplasmonic nanostructures fabrication based on the pulse force nanolithography method. It allows one to create the high-quality magnetoplasmonic nanostructures that have lower total losses than the gratings made by the electron beam lithography. The method provides control of the SPP excitation efficiency by varying the grating parameters such as the scratching depth or the number of the scratches in a single period. The quality of the plasmonic gratings was estimated by means of the transverse magneto-optical Kerr effect that is extremely sensitive to the finesse of a plasmonic structure.