Molecular beam epitaxy of single-crystalline bixbyite (In$_{1-x}$Ga$_x$)$_2$O$_3$ films ($x \leq 0.18$): Structural properties and consequences of compositional inhomogeneity
Alexandra Papadogianni, Charlotte Wouters, Robert Schewski, Johannes, Feldl, Jonas L\"ahnemann, Takahiro Nagata, Elias Kluth, Martin Feneberg,, R\"udiger Goldhahn, Manfred Ramsteiner, Martin Albrecht, Oliver Bierwagen

TL;DR
This study demonstrates the heteroepitaxial growth of single-crystalline bixbyite (In$_{1-x}$Ga$_x$)$_2$O$_3$ films with controlled composition and analyzes the effects of compositional inhomogeneity on structural and optical properties.
Contribution
It provides new insights into the growth conditions, compositional distribution, and structural integrity of (In$_{1-x}$Ga$_x$)$_2$O$_3$ films up to x=0.18, highlighting the effects of Ga inhomogeneity.
Findings
Single-crystalline (In$_{1-x}$Ga$_x$)$_2$O$_3$ films grown on YSZ substrates.
Inhomogeneous Ga distribution with high-Ga inclusions for x > 0.11.
Saturation of optical and spectroscopic properties at high Ga content.
Abstract
In this work, we show the heteroepitaxial growth of single-crystalline bixbyite (InGa)O films on (111)-oriented yttria-stabilized zirconia substrates using plasma-assisted molecular beam epitaxy under various growth conditions. A pure InO buffer layer between the substrate and (InGa)O alloy is shown to result in smoother film surfaces and significantly improved crystallinity. Symmetric out-of-plane 2 x-ray diffraction scans show a single (111) crystal orientation and transmission electron microscopy confirms the single-crystallinity up to and only slight film quality deterioration with increasing Ga content. Partially relaxed layers are demonstrated via reciprocal space mapping with lattice parameters fitting well to Vegard's law. However, the Ga cations are not evenly distributed within the films containing…
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Taxonomy
TopicsGa2O3 and related materials · ZnO doping and properties · Electronic and Structural Properties of Oxides
