Role of surface termination in the metal-insulator transition of V$_2$O$_3$(0001) ultrathin films
Asish K. Kundu, Sukanta Barman, Krishnakumar S. R. Menon

TL;DR
This study investigates how different surface terminations in ultrathin V₂O₃ films influence the metal-insulator transition, revealing surface effects, spectral weight redistribution, and the importance of electron correlations.
Contribution
It demonstrates that surface termination can suppress or modify the MIT in V₂O₃ films and highlights the role of surface effects and electron correlations in the transition.
Findings
MIT can be partially or fully suppressed at the surface
Spectral weight redistributes across the MIT
Spectral weight sum rules break down in the system
Abstract
Surface termination is known to play an important role in determining the physical properties of materials. It is crucial to know how surface termination affects the metal-insulator transition (MIT) of VO films for both fundamental understanding and its applications. By changing growth parameters, we achieved a variety of surface terminations in VO films that are characterized by low energy electron diffraction (LEED) and photoemission spectroscopy techniques. Depending upon the terminations, our results show MIT can be partially or fully suppressed near the surface region due to the different filling of the electrons at the surface and sub-surface layers and change of screening length compared to the bulk. Across MIT, a strong redistribution of spectral weight and its transfer from high-to-low binding energy regime is observed in a wide-energy-scale. Our results show…
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