Shaping the modal confinement in silicon nanophotonic waveguides through dual-metamaterial engineering
T. T. D. Dinh, X. Le Roux, J. Zhang, M. Montesinos-Ballester, C., Lafforgue, D. Benedikovic, P. Cheben, E. Cassan, D. Marris-Morini, L. Vivien,, C Alonso-Ramos

TL;DR
This paper introduces a dual-metamaterial engineering approach to silicon nanophotonic waveguides, enabling independent control of modal confinement and improved evanescent field interaction for sensing and integration.
Contribution
It presents a novel dual-metamaterial waveguide design that enhances control over modal confinement beyond traditional strip waveguides.
Findings
Increased air overlap (0.35 vs. 0.3) with dual-metamaterial design.
Achieved similar quality factors (~30,000) as strip waveguides in experiments.
Demonstrated improved external confinement factors with the new geometry.
Abstract
Flexible control of the modal confinement in silicon photonic waveguides is an appealing feature for many applications, including sensing and hybrid integration of active materials. In most cases, strip waveguides are the preferred solution to maximize the light interaction with the waveguide surroundings. However, the only two degrees of freedom in Si strip waveguides are the width and thickness, resulting in limited flexibility in evanescent field control. Here, we propose and demonstrate a new strategy that exploits metamaterial engineering of the waveguide core and cladding to control the index contrast in the vertical and horizontal directions, independently. The proposed dual-material geometry yields a substantially increased calculated overlap with the air (0.35) compared to the best-case scenario for a strip waveguide (0.3). To experimentally demonstrate the potential of this…
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Taxonomy
TopicsPhotonic and Optical Devices · Plasmonic and Surface Plasmon Research · Photonic Crystals and Applications
