Neutral atom scattering based mapping of atomically thin layers

TL;DR

This study demonstrates that low energy neutral atom scattering can effectively image and distinguish monolayer thin films like MoS₂ on substrates, providing detailed insights into atom-surface interactions.

Contribution

The paper introduces a sensitive neutral atom scattering technique capable of mapping atomically thin layers and analyzing collision dynamics.

Findings

Able to distinguish monolayer MoS₂ from substrate

Systematic changes in scattered atom flux enable surface mapping

Insights into atom-surface collision dynamics

Abstract

Imaging surfaces using low energy neutral atom scattering is a relatively recent development in the field of microscopy. In this work we demonstrate that this technique is sensitive enough to distinguish films as thin as a single monolayer from the underlying substrate. Using collimated beams of He and Kr atoms as an incident probe on MoS$_2$ films grown on SiO$_2$/Si substrate, we observe systematic changes in the scattered atom flux which allows us to map the thin MoS$_2$ films. Measurements carried out by varying incidence energy using both He and Kr provides insights into the details of atom-surface collision dynamics and its role in contrast generation.