High duty cycle EUV radiation source based on inverse Compton scattering

TL;DR

This paper proposes a high duty cycle EUV radiation source utilizing inverse Compton scattering with a high repetition-rate laser-electron interaction, promising compactness and cost-effectiveness for various applications.

Contribution

It introduces a novel high repetition-rate ICS-based EUV source scheme that enhances system efficiency and reduces size and cost compared to traditional methods.

Findings

Achieves high repetition-rate EUV generation

Reduces system size and expense

Potential applications in research and industry

Abstract

Inverse Compton scattering (ICS) can obtain quasi-monochromatic and directional EUV radiation via a MeV-scale energy electron beam and a micron-scale wavelength laser beam, which enables a dramatic reduction in dimension and expense of the system, and makes it an attractive technology in research, industry, medicine and homeland security. Here we propose an EUV source based on high repetition ICS system. The scheme exploits the output from the laser-electron interaction between a MW-ps laser at MHz repetition-rate and a high quality electron beam with an energy of a few MeV at MHz repetition-rate.