Spalling-induced liftoff and transfer of electronic films using a van der Waals release layer
Eric W. Blanton, Michael J. Motala, Timothy A. Prusnick, Albert, Hilton, Jeff L. Brown, Arkka Bhattacharyya, Sriram Krishnamoorthy, Kevin, Leedy, Nicholas R. Glavin, Michael Snure

TL;DR
This paper demonstrates a novel method for transferring thin electronic films using a van der Waals BN layer and controlled spalling with a stressed metal layer, improving yield and precision in heterogeneous electronics integration.
Contribution
It introduces a new transfer technique utilizing a BN van der Waals layer and stress-induced spalling, enhancing control and efficiency in electronic film transfer.
Findings
Controlled spalling improves process yield.
Residual stress influences cracking and bowing.
Selected area lift-off enables device isolation.
Abstract
Heterogeneous integration strategies are increasingly being employed to achieve more compact and capable electronics systems for multiple applications including space, electric vehicles, and wearable and medical devices. To enable new integration strategies, the growth and transfer of thin electronic films and devices, including III-nitrides, metal oxides, and two-dimensional (2D) materials, using 2D boron nitride (BN)-on-sapphire templates is demonstrated. The van der Waals BN layer, in this case, acts as a preferred mechanical release layer for precise separation at the substrate-film interface and leaves a smooth surface suitable for van der Waals bonding. A tensilely-stressed Ni layer sputtered on top of the film induces controlled spalling fracture which propagates at the BN/sapphire interface. By incorporating controlled spalling, the process yield and sensitivity is greatly…
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