4.2 K Sensitivity-Tunable Radio Frequency Reflectometry of a Physically Defined P-channel Silicon Quantum Dot
Sinan Bugu, Shimpei Nishiyama, Kimihiko Kato, Yongxun Liu, Shigenori, Murakami, Takahiro Mori, Thierry Ferrus, Tetsuo Kodera

TL;DR
This paper presents a sensitive, tunable RF reflectometry technique for measuring silicon quantum dots at cryogenic temperatures, enhancing readout speed and sensitivity for quantum computing architectures.
Contribution
It introduces a novel RF reflectometry circuit with tunable varactors for improved measurement of silicon quantum dots at 4.2 K.
Findings
Successful observation of Coulomb diamonds at 4.2 K
Effective RF matching with tunable varactors
Analysis of RF leakage effects in nanostructures
Abstract
We demonstrate the measurement of p-channel silicon-on-insulator quantum dots at liquid helium temperatures by using a radio frequency (rf) reflectometry circuit comprising of two independently tunable GaAs varactors. This arrangement allows observing Coulomb diamonds at 4.2\,K under nearly best matching condition and optimal signal-to-noise ratio. We also discuss the rf leakage induced by the presence of the large top gate in MOS nanostructures and its consequence on the efficiency of rf-reflectometry. These results open the way to fast and sensitive readout in multi-gate architectures, including multi-qubit platforms.
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