Electron transport in dual-gated three-layer MoS$_2$
M. Masseroni (1), T. Davatz (1) R. Pisoni (1), F. K. de Vries (1), P., Rickhaus (1), T. Taniguchi (2), K. Watanabe (3), V. Fal'ko (4), T. Ihn (1),, K. Ensslin (1) ((1) Solid State Physics Laboratory, ETH Z\"urich, Switzerland

TL;DR
This study uses magnetotransport experiments to explore the conduction band structure of dual-gated three-layer MoS$_2$, revealing layer-specific electron behavior, degeneracy at K points, and interlayer scattering effects.
Contribution
It provides detailed experimental insights into the layer-dependent electronic properties and scattering mechanisms in three-layer MoS$_2$, highlighting differences from zero asymmetry band calculations.
Findings
Electrons accumulate in the layer closest to the positive gate.
Twofold Landau level degeneracy suggests minima at $ ext{K}$ points.
Interlayer scattering occurs when outer layer bands are in resonance.
Abstract
The low-energy band structure of few-layer MoS is relevant for a large variety of experiments ranging from optics to electronic transport. Its characterization remains challenging due to complex multi band behavior. We investigate the conduction band of dual-gated three-layer MoS by means of magnetotransport experiments. The total carrier density is tuned by voltages applied between MoS and both top and bottom gate electrodes. For asymmetrically biased top and bottom gates, electrons accumulate in the layer closest to the positively biased electrode. In this way, the three-layer MoS can be tuned to behave electronically like a monolayer. In contrast, applying a positive voltage on both gates leads to the occupation of all three layers. Our analysis of the Shubnikov--de Haas oscillations originating from different bands lets us attribute the corresponding carrier…
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Taxonomy
Topics2D Materials and Applications · Fuel Cells and Related Materials · Molecular Junctions and Nanostructures
