Enormous Berry-Curvature-Driven Anomalous Hall Effect in Topological Insulator (Bi,Sb)2Te3 on Ferrimagnetic Europium Iron Garnet beyond 400 K
Wei-Jhih Zou (1), Meng-Xin Guo (1), Jyun-Fong Wong (1), Zih-Ping Huang, (2), Jui-Min Chia (1), Wei-Nien Chen (1), Sheng-Xin Wang (1), Keng-Yung Lin, (2), Lawrence Boyu Young (2), Yen-Hsun Glen Lin (2), Mohammad Yahyavi (3),, Chien-Ting Wu (4), Horng-Tay Jeng (1, 5, and 6)

TL;DR
This study demonstrates a giant anomalous Hall effect in topological insulator/ferromagnetic insulator heterostructures at temperatures exceeding 400 K, driven by Berry curvature and interface engineering, surpassing previous records.
Contribution
It reports the first observation of an enormous Berry-curvature-driven anomalous Hall effect in (Bi,Sb)2Te3 on EuIG at temperatures above 400 K, with insights from first-principles calculations.
Findings
RAHE exceeds 8 Ω at 300 K, sustaining to 400 K
No sign change in AHE loops with chemical potential variation
Observation of topological Hall effect at low temperatures
Abstract
To realize the quantum anomalous Hall effect (QAHE) at elevated temperatures, the approach of magnetic proximity effect (MPE) was adopted to break the time-reversal symmetry in the topological insulator (Bi0.3Sb0.7)2Te3 (BST) based heterostructures with a ferrimagnetic insulator europium iron garnet (EuIG) of perpendicular magnetic anisotropy. Here we demonstrate phenomenally large anomalous Hall resistance (RAHE) exceeding 8 {\Omega} (\r{ho}AHE of 3.2 {\mu}{\Omega}*cm) at 300 K and sustaining to 400 K in 35 BST/EuIG samples, surpassing the past record of 0.28 {\Omega} (\r{ho}AHE of 0.14 {\mu}{\Omega}*cm) at 300 K. The remarkably large RAHE as attributed to an atomically abrupt, Fe-rich interface between BST and EuIG. Importantly, the gate dependence of the AHE loops shows no sign change with varying chemical potential. This observation is supported by our first-principles calculations…
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Taxonomy
TopicsTopological Materials and Phenomena · Quantum many-body systems · Graphene research and applications
