Droplet Epitaxy of Semiconductor Nanostructures for Quantum Photonic Devices
Massimo Gurioli, Zhiming Wang, Armando Rastelli, Takashi Kuroda,, Stefano Sanguinetti

TL;DR
This paper reviews droplet epitaxy and local-droplet-etching methods for creating semiconductor quantum dots, emphasizing their potential for quantum photonic devices and comparing their advantages and challenges.
Contribution
It provides a comprehensive survey of DE and LDE techniques, highlighting recent advancements and open challenges for quantum communication applications.
Findings
DE and LDE can produce high-quality quantum dots with desirable optical properties.
Recent developments suggest DE and LDE may outperform traditional SK methods in certain applications.
The survey identifies key challenges for integrating these methods into quantum photonic devices.
Abstract
The long dreamed quantum internet would consist of a network of quantum nodes (solid-state or atomic systems) linked by flying qubits, naturally based on photons, travelling over long distances at the speed of light, with negligible decoherence. A key component is a light source, able to provide single or entangled photon pairs. Among the different platforms, semiconductor quantum dots are very attractive, as they can be integrated with other photonic and electronic components in miniaturized chips. In the early 1990s two approaches were developed to synthetize self-assembled epitaxial semiconductor quantum dots (QDs), or artificial atoms, namely the Stranski-Krastanov (SK) and the droplet epitaxy (DE) method. Because of its robustness and simplicity, the SK method became the workhorse to achieve several breakthroughs in both fundamental and technological areas. The need for specific…
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