Solid phase epitaxial growth of the correlated-electron transparent conducting oxide SrVO3
Samuel D. Marks, Lin Lin, Peng Zuo, Patrick J. Strohbeen, Ryan Jacobs,, Dongxue Du, Jason R. Waldvogel, Rui Liu, Donald E. Savage, John H. Booske,, Jason K. Kawasaki, Susan E. Babcock, Dane Morgan, and Paul G. Evans

TL;DR
This paper demonstrates the fabrication of high-quality SrVO3 transparent conducting oxide films via solid phase epitaxy, achieving excellent electrical and optical properties suitable for applications, with insights into the crystallization process and thermodynamics.
Contribution
It introduces a novel SPE method for crystallizing amorphous SrVO3 films with detailed analysis of the process and thermodynamic conditions, enabling large-area and complex geometry applications.
Findings
SrVO3 films exhibit low resistivity and high transparency.
Crystallization occurs via thermally activated interface propagation.
Thermodynamic calculations align with experimental conditions.
Abstract
SrVO3 thin films with a high figure of merit for applications as transparent conductors were crystallized from amorphous layers using solid phase epitaxy (SPE). Epitaxial SrVO3 films crystallized on SrTiO3 using SPE exhibit a room temperature resistivity of 2.5 x 10-5 Ohms cm, a residual resistivity ratio of 3.8, and visible light transmission above 0.5 for a 60 nm-thick film. SrVO3 layers were deposited at room temperature using radio-frequency sputtering in an amorphous form and subsequently crystallized by heating in controlled gas environment. The lattice parameters and mosaic angular width of x-ray reflections from the crystallized films are consistent with partial relaxation of the strain resulting from the epitaxial mismatch between SrVO3 and SrTiO3. A reflection high-energy electron diffraction study of the kinetics of SPE indicates that crystallization occurs via the thermally…
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