Importance of surface oxygen vacancies for ultrafast hot carrier relaxation and transport in Cu$_2$O
Chiara Ricca, Lisa Grad, Matthias Hengsberger, J\"urg Osterwalder,, Ulrich Aschauer

TL;DR
This study reveals that surface oxygen vacancies in Cu₂O significantly influence ultrafast hot carrier relaxation and transport, impacting its efficiency as a photoelectrode in water splitting applications.
Contribution
The paper provides a detailed theoretical analysis of how oxygen vacancies affect charge dynamics in Cu₂O, highlighting the importance of defect engineering for improved performance.
Findings
Oxygen vacancies are doubly ionized and create defect states that suppress electron transport.
The excited state of a singly charged vacancy facilitates ultrafast non-radiative electron capture.
Carrier lifetime due to vacancy-related processes is approximately 0.04 ps.
Abstract
CuO has appealing properties as an electrode for photo-electrochemical water splitting, yet its practical performance is severely limited by inefficient charge extraction at the interface. Using hybrid DFT calculations, we investigate carrier capture processes by oxygen vacancies (V) in the experimentally observed ()R30 reconstruction of the dominant (111) surface. Our results show that these V are doubly ionized and that associated defects states strongly suppress electron transport. In particular, the excited electronic state of a singly charged V plays a crucial role in the non-radiative electron capture process with a capture coefficient of about 10~cm/s and a lifetime of 0.04~ps, explaining the experimentally observed ultrafast carrier relaxation. These results highlight that engineering the…
Peer Reviews
No public reviews on file for this paper yet. If you reviewed it on a platform where reviews are public (OpenReview, ICLR, NeurIPS, ICML), you can paste yours below so the community can read it here.
Videos
No videos yet. Explain this paper in a talk, walkthrough, or lecture? Add one.
Taxonomy
TopicsCopper-based nanomaterials and applications · Electronic and Structural Properties of Oxides · Surface and Thin Film Phenomena
