Temperature Dependence of $\beta-Ga_2O_3$ Heteroepitaxy on c-plane Sapphire using Low Pressure Chemical Vapor Deposition
Gavax Joshi, Yogesh Singh Chauhan, Amit Verma

TL;DR
This study investigates how growth temperature affects the quality and properties of $eta-Ga_2O_3$ thin films grown on sapphire substrates via LPCVD, revealing optimal conditions for crystalline quality and optical properties.
Contribution
It provides a systematic analysis of temperature effects on $eta-Ga_2O_3$ epitaxial film growth using LPCVD, highlighting the temperature range for high-quality crystalline films.
Findings
Crystalline $eta-Ga_2O_3$ films form at temperatures ≥850°C.
Crystallinity improves with increasing temperature, with a minimum FWHM at 925°C.
Optical bandgap remains around 4.77-4.80 eV for temperatures ≥875°C.
Abstract
has drawn significant attention for power electronics and deep ultraviolet (UV) photodetectors owing to its wide bandgap of ~ 4.4 - 4.9 eV and high electric breakdown strength ~7-8 MV/cm. Growth of epitaxial thin films with high growth rate has been recently reported using low pressure chemical vapor deposition (LPCVD) technique. In this work, we have investigated the effect of growth temperature on films grown on c-plane sapphire substrates using LPCVD. We performed growths by varying temperatures from 800C to 950C while keeping all other growth parameters (Ar/O gas flow rates, growth pressure, and Gallium precursor to substrate distance) constant. Optical, structural, and surface characterizations are performed to determine the bandgap, phase purity, crystal orientation, and crystalline quality of the grown thin…
Peer Reviews
No public reviews on file for this paper yet. If you reviewed it on a platform where reviews are public (OpenReview, ICLR, NeurIPS, ICML), you can paste yours below so the community can read it here.
Videos
No videos yet. Explain this paper in a talk, walkthrough, or lecture? Add one.
Taxonomy
TopicsGa2O3 and related materials · Advanced Photocatalysis Techniques · GaN-based semiconductor devices and materials
