Highly effective gating of graphene on GaN
Jakub Kierdaszuk, Ewelina Rozbiega{\l}a, Karolina Pi\k{e}tak,, Sebastian Z{\l}otnik, Aleksandra Przew{\l}oka, Aleksandra Krajewska,, Wawrzyniec Kaszub, Maria Kami\'nska, Andrzej Wysmo{\l}ek, Johannes Binder,, Aneta Drabi\'nska

TL;DR
This paper demonstrates highly effective low-bias gating of graphene on GaN using Schottky diodes, revealing insights into electron transfer, carrier concentration, and potential applications in sensors and electronics.
Contribution
It introduces a novel graphene/GaN Schottky diode structure with enhanced gating efficiency and detailed Raman analysis of charge transfer and stacking effects.
Findings
G Raman G band shift >8.5 cm-1 indicates increased carrier concentration.
Graphene on GaN behaves like a capacitor at reverse bias.
High uniformity of gating efficiency across the surface.
Abstract
By using four layered graphene/gallium nitride (GaN) Schottky diodes with an undoped GaN spacer, we demonstrate highly effective gating of graphene at low bias rendering this type of structure very promising for potential applications. An observed Raman G band position shift larger than 8.5 cm-1 corresponds to an increase in carrier concentration of about 1.2x10^13 cm-2. The presence of a distinct G band splitting together with a narrow symmetric 2D band indicates turbostratic layer stacking and suggests the presence of a high potential gradient near the Schottky junction even at zero bias. The subbands characterized by the highest Raman energies correspond to the largest concentration of electrons. An analysis based on electroreflectance measurements and a modified Richardson equation confirmed that graphene on n-GaN separated by an undoped GaN spacer behaves like a capacitor at…
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