Combinatorial Large-area MoS2/Anatase-TiO2 interface: A Pathway to Emergent Optical and Opto-electronic Functionalities
Tuhin Kumar Maji, J R Aswin, Subhrajit Mukherjee, Rajath Alexander,, Anirban Mondal, Sarthak Das, R. K. Sharma, N. K. Chakraborty, K. Dasgupta,, Anjanashree M R Sharma, Ranjit Hawalder, Manjiri Pandey, Akshay Naik, Kausik, Majumdar, Samir Kumar Pal, K V Adarsh, Samit Kumar Ray

TL;DR
This study explores large-area MoS2/Anatase-TiO2 interfaces grown by different techniques, revealing how their structural differences influence electronic, optical, and opto-electronic properties, with potential applications in phototransistors.
Contribution
It provides a comparative analysis of MoS2/TiO2 interfaces grown by ALD and PLD, linking growth methods to interface properties and functionalities, which was previously unresolved.
Findings
PLD-grown interface shows defect-induced mid-gap states and quenched excitons.
ALD-grown interface exhibits clear A and B excitons, indicating fewer defects.
PLD interface demonstrates enhanced photo-transport and potential as a saturable absorber.
Abstract
Interface of transition metal dichalcogenide (TMDC) and high-k dielectric transition metal oxides (TMO) had triggerred umpteen discourses due to the indubitable impact of TMO in reducing the contact resistances and restraining the Fermi-level pinning for the metal-TMDC contacts. In the present work, we focus on the unresolved tumults of large-area TMDC/TMO interfaces, grown by adopting different techniques. Here, on a pulsed laser deposited (PLD) MoS2 thin film, a layer of TiO2 is grown by using both atomic layer deposition (ALD) and PLD. These two different techniques emanate TiO2 layers with different crystalline properties, thicknesses and interfacial morphologies, subsequently influencing the electronic and optical properties of the interfaces. In addition, they manifest a boost in the extent of p-type doping with increasing thickness of TiO2, as emerged after analyzing the…
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