Growth and atomically resolved polarization mapping of ferroelectric $Bi_2WO_6$ thin film
Jihwan Jeong, Junsik Mun, Saikat Das, Jinkwon Kim, Jeong Rae Kim, Wei, Peng, Miyoung Kim, and Tae Won Noh

TL;DR
This study reports the growth, atomic-scale polarization mapping, and domain switching behavior of ferroelectric Bi2WO6 thin films, revealing the influence of growth conditions on phase stability and detailed domain structures with potential applications in ferroelectric devices.
Contribution
It provides the first atomic-scale polarization mapping of Bi2WO6 thin films and elucidates the effects of growth parameters on phase stability and domain configurations.
Findings
Oxygen pressure during growth determines phase stability.
Atomic-scale STEM reveals in-plane W atom off-centering.
Multidomain structure with 90° and 180° domain walls observed.
Abstract
Aurivillius ferroelectric (BWO) encompasses a broad range of functionalities, including robust fatigue-free ferroelectricity, high photocatalytic activity, and ionic conductivity. Despite these promising characteristics, an in-depth study on the growth of BWO thin films and ferroelectric characterization, especially at the atomic scale, is still lacking. Here, we report pulsed laser deposition (PLD) of BWO thin films on (001) substrates and characterization of ferroelectricity using the scanning transmission electron microscopy (STEM) and piezoresponse force microscopy (PFM) techniques. We show that the background oxygen gas pressure used during PLD growth mainly determines the phase stability of BWO films, whereas the influence of growth temperature is comparatively minor. Atomically resolved STEM study of a fully strained BWO film revealed collective in-plane…
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