Light-emission from ion-implanted group-IV nanostructures
Moritz Brehm

TL;DR
This paper explores the use of defect-enhanced quantum dots in silicon to create stable, efficient light-emitting devices, advancing silicon photonics by addressing the challenge of monolithic light sources.
Contribution
It introduces defect-enhanced quantum dots via ion implantation as a novel approach for silicon-based light emitters with improved stability and scalability.
Findings
DEQDs exhibit high temperature stability up to 100°C
Electrically-driven LEDs using DEQDs demonstrate practical application
Light emission scales with DEQD density
Abstract
Silicon photonics is destined to revolutionize technological areas, such as short-distance data transfer and sensing applications by combining the benefits of integrated optics with the assertiveness of silicon-based microelectronics. However, the lack of practical and low-cost silicon-based monolithic light sources such as light-emitting diodes and, in particular, lasers is the main bottleneck for silicon photonics to become the key technology of the 21st century. After briefly reviewing the state of the art regarding silicon-based light-emitters, we discuss the challenges and benefits of a highly flexible approach: The epitaxial incorporation of group-IV nanostructures into crystalline silicon. We argue that a paradigm change for group-IV quantum dots (QDs) can be achieved by the intentional incorporation of extended point defects inside the QDs upon low energy ion implantation. The…
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Taxonomy
TopicsSilicon Nanostructures and Photoluminescence · Semiconductor Quantum Structures and Devices · Nanowire Synthesis and Applications
