Multiwavelength electron diffraction as a tool for identifying stacking sequences in 2D materials
Pascal Puech, Iann Gerber, Fabrice Piazza, Marc Monthioux

TL;DR
This paper introduces a multiwavelength electron diffraction technique to accurately identify stacking sequences in 2D materials, including complex multi-layer arrangements with A, B, and C layers, improving discrimination over existing methods.
Contribution
The authors develop a novel multiwavelength electron diffraction method that can distinguish complex stacking sequences in 2D materials, including those with C layers, and propose a faster way to calculate diffraction spot intensities.
Findings
Able to discriminate up to 6-layer stacking sequences
Valid for materials like MoS2 and graphene
Provides a faster, more accurate analysis of stacking sequences
Abstract
Two-dimensional (2D) materials are among the most studied ones nowadays, because of their unique properties. These materials are made of, single- or few atom-thick layers assembled by van der Waals forces, hence allowing a variety of stacking sequences possibly resulting in a variety of crystallographic structures as soon as the sequences are periodic. Taking the example of few layer graphene (FLG), it is of an utmost importance to identify both the number of layers and the stacking sequence, because of the driving role these parameters have on the properties. For this purpose, analysing the spot intensities of electron diffraction patterns (DPs) is commonly used, along with attempts to vary the number of layers, and the specimen tilt angle. However, the number of sequences able to be discriminated this way remains few, because of the similarities between the DPs. Also, the possibility…
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Taxonomy
TopicsGraphene research and applications · Ga2O3 and related materials · 2D Materials and Applications
