Planar Silicon Metamaterial Lenslet Arrays for Millimeter-wavelength Imaging
Christopher M. McKenney, Jason E. Austermann, James A. Beall, Nils W., Halverson, Johannes Hubmayr, Gregory Jaehnig, Giampaolo Pisano, Sarah A., Stevenson, Aritoki Suzuki, and Jonathan A. Thompson

TL;DR
This paper presents the design, fabrication, and testing of planar silicon metamaterial lenslet arrays for millimeter-wavelength imaging, offering advantages like high precision, homogeneity, and integrated anti-reflection layers.
Contribution
It introduces a novel gradient-index metamaterial lenslet design using metal-mesh patterns on silicon, optimized via bulk-material modeling, and demonstrates successful prototype fabrication and testing.
Findings
Prototype lenslet array measurements agree with simulations
Design optimization is ongoing for broader bandwidth
Metamaterial lenslets show promise for millimeter-wave imaging applications
Abstract
Large imaging arrays of detectors at millimeter and submillimeter wavelengths have applications that include measurements of the faint polarization signal in the Cosmic Microwave Background (CMB), and submillimeter astrophysics. We are developing planar lenslet arrays for millimeter-wavelength imaging using metamaterials microlithically fabricated using silicon wafers. This metamaterial technology has many potential advantages compared to conventional hemispherical lenslet arrays, including high precision and homogeneity, planar integrated anti-reflection layers, and a coefficient of thermal expansion matched to the silicon detector wafer. Here we describe the design process for a gradient-index (GRIN) metamaterial lenslet using metal-mesh patterned on silicon and a combination of metal-mesh and etched-hole metamaterial anti-reflection layers. We optimize the design using a…
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